Deadline for Applications:
16. July 2015


Next Master Class:
26. September – 4. October 2015



The Pictoplasma Academy is a new exciting programme for further education and exchange, suitable for anyone who wants to expand their practise in any field related to the creation of characters – whether as illustrators, animation filmmakers, fine artists, or graphic, fashion, and product designers. The 8-day intensive course, supervised by tutors Rilla Alexander and Nathan Jurevicius, is lead by a team of internationally acclaimed artists and professionals, who pass on their skills in insightful lectures and hands-on workshops right across the media spectrum.

Essential part of the experience is the lively exchange in the group, with further cultural programmes such as animation screenings and museum excursions. Most of all, the Pictoplasma Academy aims to bring your personal project to the next level and help you find the strategic path to connect with key partners for its further development.


Approximately 30 international participants will have the chance to closely collaborate with leading visual artists and producers and find a path to further develop their own personal projects. The schedule of the 8 day character boot camp (September 26 – October 4) is insanely dense and will keep participants busy each day from the early morning till late at night. A rough glimpse of what to expect can be viewed HERE!  

But it doesn’t end there: During the half year following the course, participants stay in regular touch for close guidance with their tutors and faculty, and receive thorough, personal feedback leading up to the exclusive Academy group-show exhibition as central part of the official Pictoplasma Festival (Spring 2016), where all participants get the chance to present their personal work to a wide, professional, and international audience.

The deadline for applications is July 16! The Academy’s tutors will review all applications during the last week of July. Selected applicants will be notified by early August.